Quartz Glass Tube Reactor Ware

Description

This Quartz Glass Tube Reactor is engineered for high-temperature chemical synthesis, semiconductor processing, and laboratory research requiring extreme thermal stability and chemical purity. Crafted from high-quality fused quartz, it provides an inert environment for critical reactions.

Technical Specifications

• Material: 99.9% High-Purity Fused Quartz ($SiO_2$).

• Temperature Resistance: Continuous use up to 1100°C; short-term peaks up to 1300°C.

• Thermal Expansion: Extremely low ($5.5 \times 10^{-7}/°C$), providing excellent thermal shock resistance.

• Chemical Resistance: Inert to most acids, bromine, and chlorine (excluding hydrofluoric and phosphoric acids at high temperatures).

• Optical Clarity: High transmission levels from ultraviolet to infrared spectrums.

Key Features

• Thermal Endurance: Withstands rapid heating and cooling cycles without cracking or deforming.

• High Purity: Prevents sample contamination, making it ideal for semiconductor and catalyst research.

• Precision Engineering: Available in various diameters and wall thicknesses with fire-polished or ground-joint ends for airtight seals.

• Vacuum Compatible: Structural integrity remains stable under high-vacuum conditions at elevated temperatures.

Common Applications

• CVD & ALD: Chemical Vapor Deposition and Atomic Layer Deposition processes.

• Pyrolysis: High-heat decomposition of organic materials.

• Atmosphere Control: Heating samples in inert gas environments (Argon, Nitrogen).

• Solar & Semiconductor: Processing of silicon wafers and solar cell components.

Care and Handling

To maintain the longevity of the quartz, avoid touching the glass with bare hands, as skin oils can cause “devitrification” (clouding) at high temperatures. Always clean with alcohol or a dilute acid wash before firing.